
Practice Areas
Education
- J.D., 1977, Yale Law School
- B.A, 1974, State University of New York at Albany
Clerkships
- Law Clerk to The Honorable Walter K. Stapleton, United States District Court for the District of Delaware
Admissions to Practice
- Delaware, 1979
- U.S. Court of Appeals for the Third Circuit, 1984
- U.S. Court of Appeals for the Federal Circuit, 1985
- U.S. Supreme Court, 1987
Jack is a member of the Intellectual Property Litigation Group. His practice concentrates on patent litigation and encompasses many different areas of technology.
Jack has been a member of the District Court Advisory Committee for the United States District Court for the District of Delaware, the Civil Justice Reform Act Advisory Group for that Court, and the Intellectual Property Advisory Committee of that Court.
Professional and Community Activities
- Member, American Bar Association
- Member, Delaware State Bar Association
Noteworthy
- Ranked the number one Delaware patent litigator by Intellectual Asset Management magazine - IAM 250: The World's Leading Patent Litigators 2011
- Star Performer in Intellectual Property, Chambers USA: 2011 America's Leading Lawyers for Business
- Listed in The Best Lawyers in America for the past 17 years
- Lawdragon Magazine - 500 Leading Lawyers in America
- Benchmark Litigation Magazine – Delaware Litigation Star
- International Who’s Who of Patent Lawyers - 2011
News
- 25 Morris Nichols Attorneys Named to The Best Lawyers in America 2012
25 Morris Nichols attorneys have been named to The Best Lawyers in America 2012 in twenty practice areas. - Chambers USA 2011 Names Twenty Morris Nichols Attorneys and Four Practice Groups as Best In Delaware
The 2011 edition of Chambers USA: America’s Leading Lawyers for Business today ranked twenty Morris Nichols’ attorneys and four practice groups as best in Delaware. - 19 Morris Nichols Attorneys Selected for Inclusion in Super Lawyers – Delaware Edition 2011
Super Lawyers® magazine has named 19 Morris Nichols attorneys as top legal counsel in Delaware for 2011. - Morris Nichols’ Jack Blumenfeld Ranked Number One in Delaware Among World’s Foremost Patent Litigators
Jack B. Blumenfeld has been ranked the number one Delaware patent litigator by Intellectual Asset Management (IAM) magazine in the 2011 edition of IAM 250 -The World's Leading Patent Litigators. - Morris Nichols Attorneys Listed in Lawdragon’s 500 Leading Lawyers in America
Rick Alexander, Jack Blumenfeld, John Johnston, Bill Lafferty, Ken Nachbar and Gil Sparks have been recognized in Lawdragon Magazine’s listing of its 500 Leading Lawyers in America 2010. - 26 Morris Nichols Attorneys Named to The Best Lawyers in America 2011; Firm is Top-Listed in Eight Categories in Delaware
26 Morris Nichols attorneys have been recognized in The Best Lawyers in America 2011. The firm was also “Top-Listed in Delaware” in eight practice areas. - Chambers USA 2010 Names Twenty Morris Nichols Attorneys as Leading Lawyers
The 2010 edition of Chambers USA: America’s Leading Lawyers for Business today ranked twenty Morris Nichols attorneys and four practice groups as among the best in Delaware. - 18 Morris Nichols Attorneys Selected for Inclusion in Super Lawyers – Delaware Edition 2010
Super Lawyers® magazine has named 18 Morris Nichols attorneys as top legal counsel in Delaware for 2010. - Lawdragon Names Four Morris Nichols Attorneys Among 500 Leading Lawyers in America
Rick Alexander, Jack Blumenfeld, Bill Lafferty and Ken Nachbar have been named to the Lawdragon 500 Leading Lawyers in America 2010 guide.
Notable Publications and Presentations
- Vice Chancellor Donald F. Parsons, Jack B. Blumenfeld, Mary B. Graham and Leslie A. Polizoti, Explaining Venue Choice and Litigant Preferences: Solving the Delaware Mystery, ECONOMIC DAMAGES IN INTELLECTUAL PROPERTY: A HANDS-ON GUIDE TO LITIGATION 67-81 (Daniel Slottje ed., John Wiley & Sons 2006)
- Donald F. Parsons, Jr., Jack B. Blumenfeld, Mary B. Graham & Leslie A. Polizoti, Solving the Mystery of Patentees' 'Collective Enthusiasm' for Delaware, Delaware Law Review, Vol 7:2 (2005)
